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Conferences > CLEO_SI > 2011 > CML > CML6

Low-threshold whispering-gallery dye lasers by planar and 3D lithography on silicon

Tobias Grossmann, Simone Schleede, Mario Hauser, Torsten Beck, Michael Thiel, Georg von Freymann, Timo Mappes, and Heinz Kalt

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Abstract

We report on the planar and three-dimensional (3D) lithographic fabrication and optical characterization of microcavity lasers made of polymers doped with dyes with laser thresholds as low as 3 nJ per pulse at visible wavelengths.

© 2011 Optical Society of America

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