Smooth and ultra-precise silicon nanowires fabricated by conventional optical lithography

R. Palmer; L. Alloatti; D. Korn; M. Moosmann; M. Moosmann; K. Huska; U. Lemmer; D. Gerthsen; Th. Schimmel; Th. Schimmel; W. Freude; C. Koos; J. Leuthold

doi:10.1364/CLEO_SI.2011.CThZ1

CLEO:2011 - Laser Applications to Photonic Applications
OSA Technical Digest (CD) (Optica Publishing Group, 2011),
paper CThZ1
•https://doi.org/10.1364/CLEO_SI.2011.CThZ1

Smooth and ultra-precise silicon nanowires fabricated by conventional optical lithography

R. Palmer, L. Alloatti, D. Korn, M. Moosmann, K. Huska, U. Lemmer, D. Gerthsen, Th. Schimmel, W. Freude, C. Koos, and J. Leuthold

CLEO: Science and Innovations 2011

Baltimore, Maryland United States
1–6 May 2011
ISBN: 978-1-55752-910-7

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Novel Waveguides and Resonators (CThZ)

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R. Palmer, L. Alloatti, D. Korn, M. Moosmann, K. Huska, U. Lemmer, D. Gerthsen, T. Schimmel, W. Freude, C. Koos, and J. Leuthold, "Smooth and ultra-precise silicon nanowires fabricated by conventional optical lithography," in CLEO:2011 - Laser Applications to Photonic Applications, OSA Technical Digest (CD) (Optica Publishing Group, 2011), paper CThZ1.

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Abstract

We demonstrate that nanowire waveguides with nanoscale precision and ultra-smooth sidewalls can be fabricated with conventional optical lithography. The presented fabrication scheme exploits the combination of a special staggered lithographic design and preferential wet etching.

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