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III-As Pillar Arrays by Metal-Assisted Chemical Etching for Photonic Applications

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Abstract

Ordered arrays of GaAs/InGaAs micro and nanopillars are formed by metal-assisted chemical etching (MacEtch). The dependence of morphology and etch rate upon temperature, etchant composition, and doping concentration are explored and optical characteristics are discussed.

© 2013 Optical Society of America

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