Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > CLEO_SI > 2013 > CTh1J > CTh1J.3

III-As Pillar Arrays by Metal-Assisted Chemical Etching for Photonic Applications

Parsian K. Mohseni, Lei Pan, Xiang Zhao, Seung Hyun Kim, Karthik Balasundaram, Jeong Dong Kim, James J. Coleman, and Xiuling Li

Not Accessible

Your library or personal account may give you access

Abstract

Ordered arrays of GaAs/InGaAs micro and nanopillars are formed by metal-assisted chemical etching (MacEtch). The dependence of morphology and etch rate upon temperature, etchant composition, and doping concentration are explored and optical characteristics are discussed.

© 2013 Optical Society of America

PDF Article
More Like This
Non-lithographic Patterning and Metal-Assisted Chemical Etching for Manufacturing of Tunable Light-Emitting Silicon Nanowire Arrays

W. Chern, K. Hsu, I. Chun, B. Azeredo, N. Fang, P. Ferreira, and X. Li
CThV6 Conference on Lasers and Electro-Optics (CLEO:S&I) 2010

Nano Etching via Metal-assisted Chemical Etching (MaCE) for Through Silicon Via (TSV) Stacked Chips Application

C. P. Wong, Liyi Li, and Owen Hildreth
JSa1A.3 Advanced Optoelectronics for Energy and Environment (AOEE) 2013

Germanium photodiodes on pyramidal textured surface by Metal-Assisted Chemical Etching

Munho Kim, Soongyu Yi, Jeong Dong Kim, Xin Yin, Jun Li, Jihye Bong, Dong Liu, Shih-Chia Liu, Alexander Kvit, Weidong Zhou, Xudong Wang, Zongfu Yu, Zhenqiang Ma, and Xiuling Li
JTh2A.31 CLEO: Applications and Technology (CLEO:A&T) 2019

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use