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Temperature dependence of Sub-220nm Emission from GaN/AlN Quantum Structures by Plasma Assisted Molecular Beam Epitaxy

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Abstract

GaN/AlN structures are utilized to achieve deep-UV emission. By reducing thickenss of GaN QW to 1 ML, 224nm emission is achieved. A further shift to 219 nm is gettable as GaN islands are introduced.

© 2014 Optical Society of America

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