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Conferences > CLEO_SI > 2015 > SF2G > SF2G.2

Recovery Time Control in a Nanophotonic Nonlinear Gate Using Atomic Layer Deposition

Grégory Moille, Sylvain Combrié, Gaëlle Lehoucq, Laurence Morgenroth, François Neuilly, Didier Decoster, and Alfredo de Rossi

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Abstract

Atomic Layer Deposition is used to control the surface recombination of carriers in GaAs photonic crystal cavities. All-optical wavelength conversion at a GHz repetition rate is demonstrated with recovery time below 10 ps.

© 2015 Optical Society of America

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