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Conferences > CLEO_SI > 2015 > SM1G > SM1G.6

Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Qiaoqiang Gan, and Alexander Cartwright

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Abstract

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

© 2015 Optical Society of America

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