Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Electrically Pumped 1.3-µm InAs/GaAs Quantum Dot Laser Monolithically Grown on Si Substrate Lasing up to 111°C

Not Accessible

Your library or personal account may give you access

Abstract

A silicon-based InAs/GaAs quantum dot laser that lases up to 111°C, with a threshold current density of 200 A/cm2 and an output power exceeding 100 mW at room temperature, has been achieved by using InAlAs/GaAs strained-layer superlattices as dislocation filter layers.

© 2015 Optical Society of America

PDF Article
More Like This
High Performance of InAs/GaAs Quantum Dot Lasers Monolithically Grown on Si substrate with InAlAs/GaAs Dislocation Filter Layers Introducing

Mingchu Tang, Siming Chen, Qi Jiang, Jiang Wu, Alwyn Seeds, and Huiyun Liu
CB_9_2 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2015

1.3 μm InAs/GaAs Quantum Dot Lasers on Si Substrates with Current Injection across Direct-Bonded GaAs/Si Heterointerfaces

Katsuaki Tanabe, Katsuyuki Watanabe, Stephane Faure, and Yasuhiko Arakawa
Tu.6.LeSaleve.1 European Conference and Exposition on Optical Communications (ECOC) 2011

InAs/GaAs quantum dot lasers monolithically grown on silicon for silicon photonics

Siming Chen, Jiang Wu, Mingchu Tang, Mengya Liao, and Huiyun Liu
ITu3A.2 Integrated Photonics Research, Silicon and Nanophotonics (IPR) 2016

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.