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Photochemical Modification of Polymethyl Methacrylate (PMMA) for Producing Topographic and Refractive Index Contrast for Device Fabrication

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Polymethyl methacrylate (PMMA) can be modified through the use of ultraviolet radiation and cross-linking agents to produce either topographic or refractive index structures. These techniques enable the fabrication of reflectors, gratings, photonic crystals and waveguides.

© 2016 Optical Society of America

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