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Conferences > CLEO_SI > 2016 > SF1P > SF1P.3

CMOS-compatible deposition of tunable crystalline SiGe composition on insulator

F.Y. Gardes, C. Littlejohns, T.B. Dominguez, M. Nedeljkovic, G. Mashanovich, and G. Reed

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Abstract

We report a new method of deposition for crystalline SiGe and Ge on insulator. The method enable to deposit multiple concentration of SiGe or pure Ge on insulator using one deposition process.

© 2016 Optical Society of America

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