High Quality Factor Si3N4 Ring Resonators Achieved by Surface Roughness Reduction

Xingchen Ji; Xingchen Ji; Felippe A. S. Barbosa; Alex Bryant; Jaime Cardenas; Samantha P. Roberts; Michal Lipson

doi:10.1364/CLEO_SI.2016.SM2R.3

Conference on Lasers and Electro-Optics
OSA Technical Digest (2016) (Optica Publishing Group, 2016),
paper SM2R.3
•https://doi.org/10.1364/CLEO_SI.2016.SM2R.3

High Quality Factor Si₃N₄ Ring Resonators Achieved by Surface Roughness Reduction

Xingchen Ji, Felippe A. S. Barbosa, Alex Bryant, Jaime Cardenas, Samantha P. Roberts, and Michal Lipson

CLEO: Science and Innovations 2016

San Jose, California United States
5–10 June 2016
ISBN: 978-1-943580-11-8

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X. Ji, F. A. S. Barbosa, A. Bryant, J. Cardenas, S. P. Roberts, and M. Lipson, "High Quality Factor Si3N4 Ring Resonators Achieved by Surface Roughness Reduction," in Conference on Lasers and Electro-Optics, OSA Technical Digest (2016) (Optica Publishing Group, 2016), paper SM2R.3.

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Abstract

We demonstrate high-confinement Si₃N₄ ring resonators with a quality factor of 15.6 million. We show that ultra-high quality factors are achievable by using a process that addresses surface roughness on all interfaces of the waveguides.

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