On-Wafer Metrology for a Transmission Line Integrated Terahertz Source

Kassiopeia Smith; Bryan Bosworth; Nicholas Jungwirth; Jerome Cheron; Nathan Orloff; Christian Long; Dylan Williams; Richard Chamberlin; Franklyn Quinlan; Tara Fortier; Ari Feldman

doi:10.1364/CLEO_AT.2020.JTu2G.23

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2020),
paper JTu2G.23
•https://doi.org/10.1364/CLEO_AT.2020.JTu2G.23

On-Wafer Metrology for a Transmission Line Integrated Terahertz Source

Kassiopeia Smith, Bryan Bosworth, Nicholas Jungwirth, Jerome Cheron, Nathan Orloff, Christian Long, Dylan Williams, Richard Chamberlin, Franklyn Quinlan, Tara Fortier, and Ari Feldman

CLEO: Science and Innovations 2020

Washington, DC United States
10–15 May 2020
ISBN: 978-1-943580-76-7

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Joint Poster Session 6 (JTu2G)

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K. Smith, B. Bosworth, N. Jungwirth, J. Cheron, N. Orloff, C. Long, D. Williams, R. Chamberlin, F. Quinlan, T. Fortier, and A. Feldman, "On-Wafer Metrology for a Transmission Line Integrated Terahertz Source," in Conference on Lasers and Electro-Optics, OSA Technical Digest (Optica Publishing Group, 2020), paper JTu2G.23.

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Abstract

We developed a measurement system that combines on-wafer metrology and high-frequency network analysis to characterize the response of transmission-line integrated Er-GaAs and InGaAs photomixers up to 1 THz to support the telecommunication and electronics industry.

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