Numerically Accelerated Development Cycle for Ultra-high Finesse Micro-fabricated Resonators

Yizhi Luo; David Mason; James P. Hendrie; Naijun Jin; Charles A. McLemore; Prashanta Kharel; Megan Kelleher; Franklyn Quinlan; Franklyn Quinlan; Scott A. Diddams; Scott A. Diddams; Peter Rakich

doi:10.1364/CLEO_AT.2021.JW1A.17

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2021),
paper JW1A.17
•https://doi.org/10.1364/CLEO_AT.2021.JW1A.17

Numerically Accelerated Development Cycle for Ultra-high Finesse Micro-fabricated Resonators

Yizhi Luo, David Mason, James P. Hendrie, Naijun Jin, Charles A. McLemore, Prashanta Kharel, Megan Kelleher, Franklyn Quinlan, Scott A. Diddams, and Peter Rakich

CLEO: Science and Innovations 2021

San Jose, California United States
9–14 May 2021
ISBN: 978-1-943580-91-0

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Joint Poster Session II (JW1A)

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Y. Luo, D. Mason, J. P. Hendrie, N. Jin, C. A. McLemore, P. Kharel, M. Kelleher, F. Quinlan, S. A. Diddams, and P. Rakich, "Numerically Accelerated Development Cycle for Ultra-high Finesse Micro-fabricated Resonators," in Conference on Lasers and Electro-Optics, J. Kang, S. Tomasulo, I. Ilev, D. Müller, N. Litchinitser, S. Polyakov, V. Podolskiy, J. Nunn, C. Dorrer, T. Fortier, Q. Gan, and C. Saraceno, eds., OSA Technical Digest (Optica Publishing Group, 2021), paper JW1A.17.

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Abstract

We show that eigenmode solvers can drastically shorten the development cycle of high finesse micro-Fabry-Pérot resonators. In conjunction with angstrom-level surface metrology, benchmarked simulation yields accurately predict eigenmode profiles and finesses in nonstandard resonator geometries.

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