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Conferences > CLEO_SI > 2022 > SF3O > SF3O.5

Inference of Process Variations in Silicon Photonics from Characterization Measurements

Zhengxing Zhang, Sally I. El-Henawy, Carlos Ríos, and Duane S. Boning

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Abstract

A Bayesian-based method is developed to infer the distribution of systematic geometric variations in silicon photonics. Width, thickness, and partial etch depth variation distributional maps are reported for silicon nitride ring resonator characterization measurements.

© 2022 The Author(s)

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