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Conferences > CLEO_SI > 2023 > STh1N > STh1N.5

Effect of laser and target parameters on excitation dynamics and damage in silicon

Prachi Venkat and Tomohito Otobe

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Abstract

Three-Temperature modeling combined with FDTD is used to study laser excitation and damage in silicon. The model reproduces parametric dependencies observed in damage threshold of silicon and is consistent for a range of interaction conditions.

© 2023 The Author(s)

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