PSF Engineering to Reduce the Impact of Depth-Induced Aberrations on Wide-field Microscopy Imaging

Shuai Yuan; Chrysanthe Preza

doi:10.1364/COSI.2011.CTuA3

Imaging and Applied Optics
OSA Technical Digest (CD) (Optica Publishing Group, 2011),
paper CTuA3
•https://doi.org/10.1364/COSI.2011.CTuA3

PSF Engineering to Reduce the Impact of Depth-Induced Aberrations on Wide-field Microscopy Imaging

Shuai Yuan and Chrysanthe Preza

Computational Optical Sensing and Imaging 2011

Toronto Canada
10–14 July 2011
ISBN: 978-1-55752-914-5

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Imaging with Scattering and Aberrations (CTuA)

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S. Yuan and C. Preza, "PSF Engineering to Reduce the Impact of Depth-Induced Aberrations on Wide-field Microscopy Imaging," in Imaging and Applied Optics, OSA Technical Digest (CD) (Optica Publishing Group, 2011), paper CTuA3.

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Abstract

We evaluated different phase mask designs for PSF engineering using wavefront encoding, to reduce the impact of depth-induced aberrations, due to refractive index mismatch, on 3D computational wide-field microscopy.

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