Effect of third order aberrations on the performance of cubic and quartic phase masks for wavefront coding

Martin Larivière-Bastien; Simon Thibault

doi:10.1364/COSI.2014.CTh2C.2

Classical Optics 2014
OSA Technical Digest (online) (Optica Publishing Group, 2014),
paper CTh2C.2
•https://doi.org/10.1364/COSI.2014.CTh2C.2

Effect of third order aberrations on the performance of cubic and quartic phase masks for wavefront coding

Martin Larivière-Bastien and Simon Thibault

Computational Optical Sensing and Imaging 2014

Kohala Coast, Hawaii United States
22–26 June 2014
ISBN: 978-1-55752-747-9

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PSF Engineering and Extended Depth of Field Imaging (CTh2C)

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M. Larivière-Bastien and S. Thibault, "Effect of third order aberrations on the performance of cubic and quartic phase masks for wavefront coding," in Classical Optics 2014, OSA Technical Digest (online) (Optica Publishing Group, 2014), paper CTh2C.2.

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Abstract

We compare the performance of phase masks in the presence of third order aberrations. The cubic phase mask shows better performance for astigmatism while the quartic phase mask is more robust to coma.

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