Tailoring Spatial Entropy in Extreme Ultraviolet Focused Beams for Multispectral Ptychography

Xiaomeng Liu; Lars Loetgering; Anne de Beurs; Mengqi Du; Patrick Konold; Kjeld Eikema; Stefan Witte

doi:10.1364/COSI.2021.CTu6A.2

OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP)
OSA Technical Digest (Optica Publishing Group, 2021),
paper CTu6A.2
•https://doi.org/10.1364/COSI.2021.CTu6A.2

Tailoring Spatial Entropy in Extreme Ultraviolet Focused Beams for Multispectral Ptychography

Xiaomeng Liu, Lars Loetgering, Anne de Beurs, Mengqi Du, Patrick Konold, Kjeld Eikema, and Stefan Witte

Computational Optical Sensing and Imaging 2021

Washington, DC United States
19–23 July 2021
ISBN: 978-1-943580-89-7

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Ptychography II (CTu6A)

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X. Liu, L. Loetgering, A. de Beurs, M. Du, P. Konold, K. Eikema, and S. Witte, "Tailoring Spatial Entropy in Extreme Ultraviolet Focused Beams for Multispectral Ptychography," in OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), H. Hua, B. Javidi, M. Martinez-Corral, O. Matoba, A. Stern, S. Thibault, T. Alieva, J. Ke, F. Willomitzer, F. Okten, P. Silveira, P. Banerjee, E. Stoykova, D. Chu, J. Park, F. Imai, C. Joo, M. Digman, D. Gardner, S. Gladysz, D. LeMaster, S. Basu, and O. Korotkova, eds., OSA Technical Digest (Optica Publishing Group, 2021), paper CTu6A.2.

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Abstract

We demonstrate a computational approach to designing diffractive optical elements (DOEs) that can be used to focus multispectral extreme-ultraviolet radiation from a high-harmonic generation source. The polychromatic focusing properties are experimentally confirmed using ptychography.

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