Migration from Diffractive to Refractive Mask for High Quality Lensless Imaging

Ilya Reshetouski; Ryuichi Tadano; Hideki Oyaizu; Ryosuke Sawano; Jun Murayama

doi:10.1364/COSI.2022.CTh4C.4

Imaging and Applied Optics Congress 2022 (3D, AOA, COSI, ISA, pcAOP)
Technical Digest Series (Optica Publishing Group, 2022),
paper CTh4C.4
•https://doi.org/10.1364/COSI.2022.CTh4C.4

Migration from Diffractive to Refractive Mask for High Quality Lensless Imaging

Ilya Reshetouski, Ryuichi Tadano, Hideki Oyaizu, Ryosuke Sawano, and Jun Murayama

Computational Optical Sensing and Imaging 2022

Vancouver, British Columbia Canada
11–15 July 2022
ISBN: 978-1-957171-09-8

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Advances in the Design of Computational Imaging Systems (CTh4C)

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I. Reshetouski, R. Tadano, H. Oyaizu, R. Sawano, and J. Murayama, "Migration from Diffractive to Refractive Mask for High Quality Lensless Imaging," in Imaging and Applied Optics Congress 2022 (3D, AOA, COSI, ISA, pcAOP), Technical Digest Series (Optica Publishing Group, 2022), paper CTh4C.4.

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Abstract

Lensless imaging with diffractive masks suffers from strong wavelength and angular dependency of their point spread function. We demonstrate that substituting a diffractive mask with an equivalent refractive free-form surface helps to improve imaging quality.

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