Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Silicon Tunneling Devices Fabricated on SOI

Not Accessible

Your library or personal account may give you access

Abstract

The tunneling is a very promising operation principle for the future electron devices, because it is very sensitive to the applied voltage, little dependent on the ambient temperature, and becomes more evident with the size miniaturization. We will discuss two kinds of tunneling devices fabricated on SOI (Silicon-On-Insulator).

© 1997 Optical Society of America

PDF Article
More Like This
Submicron Lateral Scaling of Vertical-Transport Devices Transferred-Substrate Bipolar Transistors and Schottky-Collecto Tunnel Diodes

M. Rodwell, R. Pullela, B. Agarwal, M. Reddy, Q. Lee, J. Guthrie, D. Mensa, L. Samosk, S.C. Martin, and R.P. Smith
UD7 Ultrafast Electronics and Optoelectronics (UEO) 1997

Microdischarge devices in silicon

Thomas A. DeTemple, James W. Frame, David J. Wheeler, and J. Gary Eden
CTuP43 Conference on Lasers and Electro-Optics (CLEO:S&I) 1997

Laser doping applied to device fabrication in silicon

P. G. Carey, K. Bezjian, E. Landi, T. W. Sigmon, P. Gildea, T. J. Magee, and T. S. Fahlen
TUO1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1986

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.