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Conferences > DFM > 1995 > CDLC > CDLC719
  • Applications of Diamond Films and Related Materials: Third International Conference
  • Technical Digest Series (Optica Publishing Group, 1995),
  • paper CDLC719

Hard, Amorphous Carbon Deposited From a Fullerene Discharge

Eric B. Maiken and Peter Taborek

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Abstract

Hard, amorphous carbon films were deposited from an ion source using fullerite as carbon feedstock. For fixed ion energies, the film resistivities decreased exponentially with substrate temperature, suggesting activated growth of a conductive phase. Resistivity at 300 K ranged from 10-3 to 104 Ωm. E04 optical gaps of conductive films ranged from 0.1 to 1.1 eV.

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