Abstract

In-situ DLC/TiC composite film was coated on silicon wafer, steel and glass substrates with titanium chloride, methane, hydrogen and argon gas mixtures by R.F. plasma enhanced chemical vapor deposition. Raman spectra showed the coexistance of DLC and TiC in the films. The growth rate and DLC/TiC ratio of these films were investigated as a function of the inert gas flow rate.