Abstract

Substrate bias is known to be an important parameter in the determination of properties of films deposited by Filtered Cathodic Vacuum Arc (FCVA) technique. The bias affects the ion energies reaching the substrate during the film growth process. In this paper, substrate bias was varied keeping other deposition conditions constant to study the effect of the bias on the properties of the film. The films were characterized by their optical and mechanical parameters using the ellipsometer, profilometer, spectrometer and nanoindentor.

© 1995 Optical Society of America