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High contrast patterns generated by phase-seeded CGH extensible to 3-D patterns and binary modulation

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Abstract

By pre-seeding the phase distribution of a point-oriented CGH, controlled-width line patterns are generated with high contrast (>0.6) for precision imaging applications such as photolithography. The approach is extensible to binary phase CGH and 3-D line patterns.

© 2015 Optical Society of America

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