Inpainting to remove phase dislocations in digital holographic metrology

H.-T. Xia; H.-T. Xia; H.-T. Xia; H.-T. Xia; S. Montresor; R.-X. Guo; R.-X. Guo; J.-C. Li; F. Olchewsky; J.-M. Desse; P. Picart

doi:10.1364/DH.2017.Th1A.3

Digital Holography and Three-Dimensional Imaging
OSA Technical Digest (online) (Optica Publishing Group, 2017),
paper Th1A.3
•https://doi.org/10.1364/DH.2017.Th1A.3

Inpainting to remove phase dislocations in digital holographic metrology

H.-T. Xia, S. Montresor, R.-X. Guo, J.-C. Li, F. Olchewsky, J.-M. Desse, and P. Picart

Digital Holography and Three-Dimensional Imaging 2017

JeJu Island Republic of Korea
29 May–1 June 2017
ISBN: 978-1-943580-28-6

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Applications of DH II (Th1A)

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H. -. Xia, S. Montresor, R. -. Guo, J. -. Li, F. Olchewsky, J. -. Desse, and P. Picart, "Inpainting to remove phase dislocations in digital holographic metrology," in Digital Holography and Three-Dimensional Imaging, OSA Technical Digest (online) (Optica Publishing Group, 2017), paper Th1A.3.

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Abstract

This paper proposes a method to process phase dislocations from digital holographic metrology. The approach is based on inpainting of the phase after unwrapping. Validation is provided through a realistic simulation of phase dislocations. Comparison with several inpainting algorithms is provided, demonstrating the suitability of the approach. Experimental data from off-axis digital holographic interferometry from wake flow at Mach 0.73 are processed and quite good phase restoration can be appreciated.

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