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Spatial Light Modulator-Based Maskless Holographic Lithography on Nonplanar Surfaces

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Abstract

For maskless wide field microlithography on nonplanar surfaces we de scribe the extension of a maskless holographic SLM-based lithography system by a surface measurement method. A phase-only LCoS-SLM is used for projection of patterns and a camera to determine the surface orientation from the defocused patterns.

© 2020 The Author(s)

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