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Digital holographic microscopy for photolithographic surface patterning

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Abstract

Surface patterning of azobenzene-containing thin films using digital holography microscopy with built-in laser interference setup points a way to rapid prototyping of diffractive optical elements (DOEs). The light-induced mass-migration of photochromic materials enables the inscription of topographies in a one-step photolithographic process, which is a challenge to existing microfabrication methods. A method for real-time observation of surface modifications enables the study and control of the inscribed patterns.

© 2021 The Author(s)

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