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Diffractive Optical Elements Fabricated by Electron Beam Lithography

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Abstract

In recent years we have studied binary amplitude diffractive optical elements fabricated by means of electron beam lithography in the form of opaque chrome rulings on glass substrates and binary phase elements produced from these by contact copying into photoresist. We have investigated a range of imaging structures including zone plates, diffractive axicons, Dammann gratings and elements designed for optical testing. We are currently developing elements to generate particular aberrated wavefronts for the direct recording of volume diffractive elements in DCG and elements to generate curved line patterns for single shot CO2 laser machining.

© 1992 Optical Society of America

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