Abstract

In order to satisfy the growing industrial need for Diffractive Optical Elements (DOEs), fabricated at a low price, we investigated the gray level mask fabrication aproach. Our apoach allows mask fabrication by a single e-beam direct write step without any involved resist processing. The mask can then be used in a optical lithography tool to generate a DOE structure in photoresist. This DOE structure will then be transfered into the substrate material by the use of a chemically assisted ion beam etching (CAIBE) process.

© 1996 Optical Society of America