Abstract
We have developed several kinds of diffractive optical elements with submicron structures. This paper describes the optical elements, such as antireflection structured surface, a high efficiency computer generated hologram, blazed grating with subwavelength structure and so on. A key technology of fabrication of them is a high-density plasma etching. The profiles of subwavelength structures are controlled by etching conditions.
© 2002 Optical Society of America
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