Abstract

We have developed a new design method of periodic diffraction gratings to be fabricated with the direct-writing electron-beam lithography. The grating profile is optimized by the rigorous electromagnetic grating analysis and the proximity correction of electron scattering. When the grating has a small period, the proximity effect of the electron scattering restricts the grating profile. Our design method optimizes the grating profile under this restriction. For the period smaller than 2µm, the designed profile differs much from a profile optimized only by the grating analysis. The diffraction efficiency is reduced slightly, but the designed profile eases the fabrication with the electron-beam lithography.

© 2002 Optical Society of America