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Conferences > DP > 2019 > POS1 > 83
  • Symposium Latsis 2019 on Diamond Photonics - Physics, Technologies and Applications
  • OSA Technical Digest (Optica Publishing Group, 2019),
  • paper 83
  • •https://doi.org/10.1364/DP.2019.83

Fabrication of Single Crystal Diamond Membranes by Oxygen Plasma Deep Etching

Kuan-Ting Ho, Sichen Mi, Marcell Kiss, Adrien Toros, and Niels Quack

Open Access Open Access

Abstract

We demonstrate the single crystal diamond membrane fabrication by oxygen plasma deep etching of commercially available bulk (~300 µm thick) diamond substrate. Ion beam etching before reactive ion etching removes mechanical-polishing-induced defects, avoiding preferential etching. Re-deposition and micro-masking are mitigated by using oxidized Si carrier wafer, while preserving high etch rate (~28 µm/h).

© 2019 The Author(s)

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