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Nanoimprint lithography of textures for light trapping in thin film solar cells

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ECN and Nanoptics are developing a novel fabrication process based on nanoimprint lithography (NIL) of textures for light trapping in thin film solar cells such as thin-film silicon, OPV, CIGS and CdTe. This process is a key process in a fabrication chain of e.g. thin film silicon solar cells, which typically consists of the following steps in case of nip solar cells: 1) application of a UV lacquer which enables texturization; 2) NIL, 3) conformal sputtering of a back contact consisting of Ag or Al plus a thin layer of ZnO; 4) Si deposition with Plasma Enhanced CVD; 5) application of a top TCO by sputtering; 6) series interconnection by laser scribing and printing after deposition of the layers (reducing the total number of process steps). The process can be applied in roll-to-roll mode when using a foil substrate or in roll—to-plate mode when using a glass substrate. The UV lacquer also serves as an electrically insulating layer for cells if steel foil is used as substrate, to enable monolithic series interconnection.

© 2012 Optical Society of America

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