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Conferences > EL > 1983 > WA > WA4
  • Topical Meeting on Excimer Lasers
  • Technical Digest Series (Optica Publishing Group, 1983),
  • paper WA4

Deep uv lithography by using excimer lasers. (photo-etching characteristics and development of uniform intensity irradiation system)

Y. Kawamura, Y. Itagaki, K. Toyoda, and S. Namba

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Abstract

In this paper, the studies on the fundamental techniques of the excimer laser processing for micro--electronics1),2),3),4) are described.

© 1983 Optical Society of America

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