Abstract

The determination of phase aberrations is essential to ensure diffraction limited performance in optical imaging and three-dimensional laser fabrication [1]. It is especially crucial as the photonics community transitions from microscopy to nanoscopy and from microfabrication to nanofabrication. However, the determination of phase aberrations is often a highly parallel and nonlinear problem that necessitates specialist equipment, intensive computation, or prolonged iteration.

© 2019 IEEE