Abstract

We describe the multilayer deposition system we have developed for coating large-area, figured optics, as required for a practical extreme-ultraviolet (EUV) lithography tool. In this system, multilayers are deposited by magnetron sputtering, and coating uniformity on figured optics is adjusted by implementing contoured, shaped baffles during deposition. We also describe the EUV reflectometer we have developed, which is capable of measuring the reflectance versus wavelength across the surface of these optics, so that the coating uniformity can be determined with the required precision. Finally, we present some recent results wherein these facilities and techniques have been used to deposit high-reflectance coatings onto a variety of spherical and aspherical substrates.

© 1994 Optical Society of America