Add to BibSonomyAbstract
The surface figure of the individual mirrors of a two mirror, four reflection, ring field imaging system has been measured after each phase of the construction process: substrate fabrication, coating and potting. Contributions to the final system wavefront error and performance of the system in terms of the modulation transfer function and initial imaging tests are discussed.
© 1994 Optical Society of America
PDF ArticleMore Like This
Performance of a Two-Mirror, Four-Reflection, Ring-Field Optical System Operating at λ=13nm
B. La Fontaine, D. P. Gaines, D. R. Kania, G. E. Sommargren, S. L. Baker, and D. Ciarlo
EIE186 Extreme Ultraviolet Lithography (EUL) 1996
Four-Mirror Ring-Field System for EUV Projection Lithography
Tanya E. Jewell
EOS.98 Extreme Ultraviolet Lithography (EUL) 1994
EUV Characterization of a Four-Bounce Projection System
David P. Gaines, Stephen P. Vernon, Gary E. Sommargren, and Detlef Fuchs
TEO.171 Extreme Ultraviolet Lithography (EUL) 1994