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Conferences > EUL > 1994 > EOS > EOS.122

Soft X-Ray Projection Imaging at 4.5 nm using Schwarzschild Optics

Katsuhiko Murakami, Hiroshi Nagata, Masayuki Ohtani, Hiroaki, Oizumi, Yoshio Yamashita, and Nobufumi Atoda

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Abstract

Soft X-ray projection lithography at 4.5nm using NiCr/C multilayer-coated Schwarzschild optics was examined. Resist performance and pattern fabrication using thick resist are presented.

© 1994 Optical Society of America

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