Investigation of Image Defects in EUV Lithography Experiments

W. C. Sweatt; W. W. Chow

doi:10.1364/EUL.1994.EOS.126

Extreme Ultraviolet Lithography
Technical Digest Series (Optica Publishing Group, 1994),
paper EOS.126
•https://doi.org/10.1364/EUL.1994.EOS.126

Investigation of Image Defects in EUV Lithography Experiments

W. C. Sweatt and W. W. Chow

Extreme Ultraviolet Lithography 1994

California United States
19–21 September 1994
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W. C. Sweatt and W. W. Chow, "Investigation of Image Defects in EUV Lithography Experiments," in Extreme Ultraviolet Lithography, Technical Digest Series (Optica Publishing Group, 1994), paper EOS.126.

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Abstract

Physical-optics modeling of EUVL imaging is done with accurate descriptions of the illumination. Two EUVL optical systems are described in this paper: (1) a Schwarzchild camera, illuminated with a laser-plasma source (LPS) and a simple illuminator, and (2) a ring-field camera, illuminated with an LPS and a high-efficiency condenser.

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