Specification of the Figure and Finish of EUV Mirrors in Terms of Performance Requirements

E. L. Church; P. Z. Takacs

doi:10.1364/EUL.1994.EOS.77

Extreme Ultraviolet Lithography
Technical Digest Series (Optica Publishing Group, 1994),
paper EOS.77
•https://doi.org/10.1364/EUL.1994.EOS.77

Specification of the Figure and Finish of EUV Mirrors in Terms of Performance Requirements

E. L. Church and P. Z. Takacs

Extreme Ultraviolet Lithography 1994

California United States
19–21 September 1994
ISBN:

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EUV Optical Systems (EOS)

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E. L. Church and P. Z. Takacs, "Specification of the Figure and Finish of EUV Mirrors in Terms of Performance Requirements," in Extreme Ultraviolet Lithography, Technical Digest Series (Optica Publishing Group, 1994), paper EOS.77.

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Abstract

This paper describes the diffraction-theory relationships between mirror errors and their imaging performance. Results are illustrated for the practical case of fractal-like topographic errors.

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