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Conferences > EUL > 1994 > RMM > RMM.217

Quartz Substrates for EUV Lithography Reticles

D. R. Kania, F. J. Weber, S. P. Vernon, A. Hawryluk, S. L. Baker, A. M. Golub, A. Shikata, and E. C. Grady

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Abstract

A EUVL reticle blank was fabricated on a specially polished quartz blank. The stress-induced distortion of the multilayer coating was unacceptably large. The distortion can be effectively eliminated by coating the backside of the reticle blank with an identical coating. This strategy has the potential to eliminate multilayer induced stress distortion for the reticle blank in a manner which is compatible with the existing reticle fabrication infrastructure.

© 1994 Optical Society of America

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