Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Detailed EUV Characterization of Laser-Plasma Sources for EUV Lithography*

Not Accessible

Your library or personal account may give you access

Abstract

Emission characteristics for laser-driven EUV lithographic plasma sources have been studied exhaustively for the last four years. While debris issues now dominate research in this area, final details are being concluded on our understanding of material spectra and radiation transport of 13 nm light in laser-plasmas. Spectra of Sn, Cu, Xe, and Au were studied in the 2-20 nm region with transmission grating spectroscopy using 248 nm illumination. Additionally, conclusive results were obtained with 308 nm light, showing the pulselength threshold below which plumes no longer limit the transmission of (and thus the conversion efficiency to) 13 nm radiation.

© 1994 Optical Society of America

PDF Article
More Like This
Advanced Source Studies on Laser Produced Plasmas for EUV Lithography

R. C. Spitzer and D. P. Gaines
SEL.243 Extreme Ultraviolet Lithography (EUL) 1994

High conversion efficiency mass-limited laser plasma source for EUV lithography

C. Keyser, C-S. Koay, K. Takenoshita, M. Richardson, M. Al-Rabban, and E. Turcu
CFH1 Conference on Lasers and Electro-Optics (CLEO:S&I) 2003

The droplet laser plasma source for EUV lithography

G. Schriever, M. Richardson, and E. Turcu
CThB3 Conference on Lasers and Electro-Optics (CLEO:S&I) 2000

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.