Abstract
Laser produced plasmas from solid metal targets have been shown to produce bright EUV radiation with conversion efficiencies of up to 1.8%1 within the bandwidth of 0.3 nm at the wavelength of 13 nm, a favored wavelength choice for projection lithography2. However, a severe heretofore problem associated with laser plasma has been the presence of debris particles. These debris particles form deleterious thin coatings on any surface with direct line of sight to the plasma at rates which would quickly destroy the reflectivity of multilayer collector optics in envisioned lithography system. This problem has been recognized for some time3 and measures, such as low pressure gas interdiction4 and the use of a fast shutter system5, have been devised to counteract this deposition effect. In addition, special target designs, such as thin tape targets5,6 and a cryogenic Xe target7, are also under investigation in attempts to reduce the yield of debris production from laser plasmas.
© 1994 Optical Society of America
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