Performance Criteria of Mass-Limited Ice Laser Plasma Targets for EUV Lithography

Martin Richardson; Feng Jin

doi:10.1364/EUL.1994.SEL.265

Extreme Ultraviolet Lithography
Technical Digest Series (Optica Publishing Group, 1994),
paper SEL.265
•https://doi.org/10.1364/EUL.1994.SEL.265

Performance Criteria of Mass-Limited Ice Laser Plasma Targets for EUV Lithography

Martin Richardson and Feng Jin

Extreme Ultraviolet Lithography 1994

California United States
19–21 September 1994
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Sources for EUV Lithography (SEL)

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M. Richardson and F. Jin, "Performance Criteria of Mass-Limited Ice Laser Plasma Targets for EUV Lithography," in Extreme Ultraviolet Lithography, Technical Digest Series (Optica Publishing Group, 1994), paper SEL.265.

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Abstract

The operation of a laser plasma source in a demonstration production-line EUV lithography system will have to meet strict cost and operation criteria. We examine current approaches, especially the mass-limited ice target concept, and compare their anticipated performance with that demanded by accepted system cost scenarios.

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