Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > EUL > 1994 > TEO > TEO.134

Point Diffraction Interferometry at EUV Wavelengths

K. A. Goldberg, R. Beguiristain, J. Bokor, H. Medecki, K. Jackson, D. T. Attwood, G. E. Sommargren, J. P. Spallas, and R. Hostetler

Not Accessible

Your library or personal account may give you access

Abstract

Point diffraction interferometry is a common-path technique that is suitable for at-wavelength testing of EUV lithography optics. We have constructed and successfully tested such a device at the Advanced Light Source at Lawrence Berkeley Laboratory. Preliminary results on the characterization of the wavefront produced by a Fresnel zone plate lens are presented. Reference wavefront quality and thermal effects are also discussed.

© 1994 Optical Society of America

PDF Article
More Like This
At-Wavelength Metrology of EUV Cameras using Lateral-Shearing Interferometry

Z. Tan, A. A. MacDowell, B. La Fontaine, J. Russo, J. E. Bjorkholm, D. Tennant, D. Taylor, M. Himel, O. R. Wood, R R. Freeman, W. K. Waskiewicz, D. L. Windt, D. White, S. Spector, A. K. Ray-Chaudhuri, and R. H. Stulen
TEO.151 Extreme Ultraviolet Lithography (EUL) 1994

Phase-Shifting Point Diffraction Interferometry for At-Wavelength Testing of Lithographic Optics

E. Tejnil, K. A. Goldberg, H. Medecki, R. Beguiristain, J. Bokor, and D. T. Attwood
OM118 Extreme Ultraviolet Lithography (EUL) 1996

Point Diffraction Interferometry: A EUV Projection Lithography System Alignment and Qualification Tool

Patrick Naulleau, Kenneth A. Goldberg, Sang Lee, Cynthia Bresloff, David T. Attwood, and Jeffrey Bokor
OTuD.3 Optical Fabrication and Testing (OF&T) 1998

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use