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Conferences > EUL > 1994 > TEO > TEO.151

At-Wavelength Metrology of EUV Cameras using Lateral-Shearing Interferometry

Z. Tan, A. A. MacDowell, B. La Fontaine, J. Russo, J. E. Bjorkholm, D. Tennant, D. Taylor, M. Himel, O. R. Wood, R R. Freeman, W. K. Waskiewicz, D. L. Windt, D. White, S. Spector, A. K. Ray-Chaudhuri, and R. H. Stulen

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Abstract

We present the development of an extreme ultraviolet (EUV) interferometer for testing EUV lithography optics operating at a wavelength of 13 nm using the U13 undulator beamline at the National Synchrotron Light Source. The design and implementation of a lateral-shearing interferometry test will be described.

© 1994 Optical Society of America

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