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Conferences > EUL > 1994 > TEO > TEO.167

Extreme Ultraviolet Moiré Interferometry

B. La Fontaine, D. L. White, A. A. MacDowell, Z. Tan, D. M. Tennant, and O. R. Wood

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Abstract

One of the major challenges facing the extreme ultraviolet (EUV) projection lithography program is realizing high resolution, diffraction limited imaging. Even though near diffraction-limited images have been obtained with different systems, at λ =14 nm1 and λ =42 nm2, a precise, quantitative characterization of the imaging capabilities of these cameras is still lacking. In this paper, we present a new test done at λ = 139Å that should provide very precise measurement of the aberrations and alignment errors of a multi-layer coated EUV camera.

© 1994 Optical Society of America

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