Improving the Figure of Very Good Mirrors by Deposition

W. C. Sweatt; J. W. Weed; A. V. Farnsworth; M. E. Warren; C. C. Neumann; R. S. Goeke; R. N. Shagam

doi:10.1364/EUL.1996.DFO149

Extreme Ultraviolet Lithography (TOPS)
Technical Digest Series (Optica Publishing Group, 1996),
paper DFO149
•https://doi.org/10.1364/EUL.1996.DFO149

Improving the Figure of Very Good Mirrors by Deposition

W. C. Sweatt, J. W. Weed, A. V. Farnsworth, M. E. Warren, C. C. Neumann, R. S. Goeke, and R. N. Shagam

Extreme Ultraviolet Lithography 1996

Massachusetts United States
1–3 May 1996
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Deposition Figuring of Optics (DFO)

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W. C. Sweatt, J. W. Weed, A. V. Farnsworth, M. E. Warren, C. C. Neumann, R. S. Goeke, and R. N. Shagam, "Improving the Figure of Very Good Mirrors by Deposition," in Extreme Ultraviolet Lithography (TOPS), Technical Digest Series (Optica Publishing Group, 1996), paper DFO149.

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Abstract

Mid-spatial frequency errors of near-perfect mirrors can be reduced by deposition through a computer-generated mask without degrading the superpolish. Experimental results are presented.

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