Abstract
We report progress in the aspherization of precision optical substrates via deposition of graded period Mo/Si multilayer coatings using a masking technique. These preliminary results show good agreement between the measured and desired thickness profiles over 85% of the sample, however, thickness deviations of up to 7% are observed in the central area. The errors are attributed to misalignments of the mask relative to the substrate during deposition.
© 1996 Optical Society of America
PDF ArticleMore Like This
C. Tarrio, E. Spiller, C. J. Evans, T. B. Lucatorto, and C. W. Clark
DFO144 Extreme Ultraviolet Lithography (EUL) 1996
S.P. Vernon, D.R. Kania, P.A. Kearney, R.A. Levesque, A.V. Hayes, B. Druz, E. Osten, R. Rajan, and H. Hedge
R44 Extreme Ultraviolet Lithography (EUL) 1996
Steven VanKerkhove and Paul Michaloski
OWF.1 Optical Fabrication and Testing (OF&T) 1996