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Conferences > EUL > 1996 > EIE > EIE186

Performance of a Two-Mirror, Four-Reflection, Ring-Field Optical System Operating at λ=13nm

B. La Fontaine, D. P. Gaines, D. R. Kania, G. E. Sommargren, S. L. Baker, and D. Ciarlo

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Abstract

The performance of an Extreme Ultraviolet Lithography (EUVL) imaging optic was characterized by printing resolution test images in resist. While features as small as 0.137µm were successfuly printed, a resolution of 0.175µm better represents the performance of the system over the full 0.9mm2 image field. The contrast of the aerial image was estimated to be approximately 40% or less for the fine features printed. This low contrast value is attributed to a degradation of the modulation transfer function (MTF) due to the presence of scattered light in the image.

© 1996 Optical Society of America

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