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Conferences > EUL > 1996 > EIE > EIE203

Measuring the Effect of Scatter on the Performance of a Lithography System

B. La Fontaine, T. P. Daly, H. N. Chapman, D. P. Gaines, D. G. Stearns, D. W. Sweeney, and D. R. Kania

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Abstract

The distribution of scattered light at the image plane of an extreme ultraviolet lithography (EUVL) system was measured, in situ. These measurements revealed a significant degradation of the modulation transfer function of the imaging optic, relative to its value in the absence of scattering.

© 1996 Optical Society of America

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